Reactor pressure: growth temperature relation for InN epilayers grown by high-pressure CVD

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TítuloReactor pressure: growth temperature relation for InN epilayers grown by high-pressure CVD
Publication TypeJournal Article
Year of Publication2010
AutoresBuegler, M, Gamage, S, Atalay, R, Wang, J, Senevirathna, I, Kirste, R, Xu, T, Jamil, M, Ferguson, I, Tweedie, J, others,
JournalProceedings of SPIE- The International Society for Optical Engineering
Volume7784